Ammonia trace gas monitoring for Semiconductor industry
The TGA320-XL model is the ultimate solution for online continuous ammonia monitoring where outstanding long term stability, mobility and multipoint sampling capabilities are required.
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Ammonia Trace Gas Analyzer ideal for airborne Molecualr Contamination investigation in the cleanroom to prevent hazing and T-topping hazards due to ammonia contamination in the DUV-lithographic process. The TGA320-XL incorporates omnisens latest improvements in semiconductor airborne contamination monitoring to continuously monitor ammonia down to levels of a fraction of a ppb and with up to 32 measuring channels. The XL model represents a major asset for continuous contamination monitoring in production processes. Its high reliability and automatic self diagnostic features guarantee a safe and accurate process monitoring in clean rooms and wafer processing mini-environments. |
Instrument Features & Benefits
- Very high sensitivity - 0.1 ppb NH3
- Expanded dynamic range - 0.1 ppb to 6’000 ppb NH3
- Very short warm up time for tool and local contamination analysis
- High selectivity – for precise ammonia measurement in cleanrooms
- Continuous and real-time unattended measurements in cleanrooms
- Mature and proven technology
- Low operational cost due to long term stability, low drifts and no consumables are required
- Fast response time guaranteed by automatic direct sampling and high flow rate
- Low maintenance operation saving highly qualified personnel costs
- User-friendly graphical interface for the operation and configuration of the system
The XL system can integrate from 4 to 32 measurement channels, configurable through Omnisens MS-Series multi-point sampling system.
Multisampling channels - MS Series
The XL system offers great flexibility in terms of multipoint sampling configuration, robust design and long term stability for 24 hour continuous operation. Its remote control capabilities and user-configurable alarms make it compatible with clean room data collection systems. The fast measurement time allows a complete and rapid coverage of production areas with a single standalone system.